摘要
介绍了PECVD工艺的种类、工艺原理以及设备的基本结构;根据多年对设备的维护经验,分析了PECVD设备的常见原因,提出了处理措施;最后,分析总结了影响PECVD工艺质量的主要因素。
This paper introduces the types of PECVD process technique, process principle, as well as the basic structure of the equipment. According to years of experience in equipment maintenance, a common cause of PECVD equipment technique are analyzed, and treatment measures are put forward.Finally, the analysis of main factors affecting the quality of PECVD process technique are summarized.
出处
《电子工业专用设备》
2015年第2期7-10,共4页
Equipment for Electronic Products Manufacturing
关键词
化学气相淀积
等离子增强型化学气相淀积
故障分析
工艺维护
Chemical vapor deposition
Plasma enhanced chemical vapor deposition（PECVD）
Technique fault analysis
Process maintenance
