宽带增透膜工艺的优化与性能分析

Optimization and Analysis of Broadband AR Coating Process

为满足望远镜等光学系统中光学元件可见光范围宽光谱增透的要求,根据Tfcale软件优化设计膜系,使用离子辅助沉积,晶振膜厚控制仪,电子束热蒸发镀膜方法,通过对镀膜工艺参数的不断改进和调整,制备了400~700nm的宽带增透膜。结果表明：所制作的可见光增透膜平均反射率达到0.36%,优于望远镜等光学系统的增透要求。

In order to meet the requirements of the optical element through the visible range such as a telescope,the design and optimization is researched based on the software Tfcale.Ion-assisted deposition,Crystal film thickness controller and an electron beam thermal evaporation deposition method were used to prepare the thin film.By improvements and adjustments continuously to the coating process parameters,the range of 400-700 nm broadband antireflection coatings was prepared.The results show that the average reflectivity of visible antireflection coating between 400-700 nm reached 0.36%,better than the requirement of telescope＇s optical system such as AR request.