摘要
The combination of deep wet etching and a magneto-rheological finishing （MRF） process is investigated to simultaneously improve laser damage resistance of a fused-silica surface at 355 nm. The subsequently deposited SiO2 coatings are researched to clarify the impact of substrate finishing technology on the coatings. It is revealed that a deep removal proceeding from the single side or double side had a significant impact on the laser-induced damage threshold （LIDT） of the fused silica, especially for the rear surface. After the deep etching, the MRF process that followed does not actually increase the LIDT, but it does ameliorate the surface qualities without additional LIDT degradation. The combination guarantee both the integrity of the surface＇s finish and the laser damage resistance of the fused silica and subsequent SiO2 coatings.
The combination of deep wet etching and a magneto-rheological finishing （MRF） process is investigated to simultaneously improve laser damage resistance of a fused-silica surface at 355 nm. The subsequently deposited SiO2 coatings are researched to clarify the impact of substrate finishing technology on the coatings. It is revealed that a deep removal proceeding from the single side or double side had a significant impact on the laser-induced damage threshold （LIDT） of the fused silica, especially for the rear surface. After the deep etching, the MRF process that followed does not actually increase the LIDT, but it does ameliorate the surface qualities without additional LIDT degradation. The combination guarantee both the integrity of the surface＇s finish and the laser damage resistance of the fused silica and subsequent SiO2 coatings.
基金
supported by the National Natural Science Foundation of China under Grant Nos.11104293 and 61308021
