钽表面非晶层的制备方法

Preparation of Tantalum Amorphous Surface Layer

采用低温离子渗氮后再熔盐阳极化的方法 ,在钽表面形成厚度达微米数量级的非晶态层 ,测试了非晶层的成分、相结构和性能。结果表明 ,该非晶层相对于直接阳极化层 ,组织致密、硬度高、粗糙度低。

The amorphous surface layer of tantalum was obtained by anodic oxidation in melting nitrate after plasma\|nitriding at relative low temperature, and the composition, phase structure and property of coating were tested. The amorphous layer had more compact structure, higher hardness, lower roughness and higher electrical resistance.