碳化硅陶瓷密封材料上沉积复合金刚石薄膜

Synthesis of Integrated Composite Diamond Film on Silicon Carbide Ceramic Sealing Material

利用直流辉光等离子体化学气相沉积（DC-GD CVD）设备在碳化硅（SiC）密封材料上沉积复合金刚石薄膜（ICD）。实验通过两步工艺,先在SiC上沉积一层微米金刚石薄膜（MCD）,然后再沉积一层纳米金刚石薄膜（NCD）形成复合金刚石薄膜（ICD）。通过场发射扫面电镜和拉曼测试,研究了MCD、NCD和ICD薄膜的表面形貌和材料结构。各种金刚石薄膜利用轮廓仪、划痕测试和摩擦磨损测试其力学性能。结果显示ICD薄膜既有较强的结合力,其摩擦系数也较低。ICD薄膜涂层的SiC密封环的摩擦系数为0.08~0.1。

The integrated composite diamond films（ ICD） was synthesized on silicon carbide（ SiC）ceramic sealing material by direct current glow discharge chemical vapor deposition（ DC-GDCVD）. A two step process syntheses of integrated composite diamond films（ ICD） were used. The morphology and structure of diamond films were observed by field-emission scanning electron microscope（ FESEM） and Raman spectroscopy（ RS）. The mechanical properties of diamond films were measured by the surface profilometer,micro-scratch tests and UMT-3 tribometer. The results show that ICD films not only exhibits high adhesion,but also exhibits smooth surface and low friction coefficient. The friction coefficient is found to be 0. 08 ~ 0. 1 in ICD films coated SiC pump seal.