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光刻机运动平台系统的模型辨识 被引量:1

Model Recognition of Lithography Motion Stage System
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摘要 针对机械谐振对超精密光刻系统的影响,对包含有机械谐振的光刻机宏微运动平台进行辨识来抑制机械谐振。首先建立单自由度宏微耦合运动模型和谐振模型,然后基于递阶辨识原理对机械谐振模型进行分段辨识,最后基于谐振模型设计陷波器,抑制机械谐振。试验结果证明,该方法有效抑制了宏微平台的机械谐振,大幅提高了系统的动态响应性能。 In view of the influence of the mechanical resonance on ultra-precision lithography system, the macro-micro motion stage containing mechanical resonance is recognized for suppressing the mechanical resonance. Firstly, the single degree of freedom ( SDOF ) macro-micro coupling model and resonance model are built, then, based on hierarchical recognition principle, the mechanical model is recognized segmentally, finally, the notch filter is designed based on resonance model for suppressing the mechanical resonance. The test results show that this method effectively suppresses the mechanical resonance of the macro-micro stage, and greatly improves the dynamic response of the system.
出处 《自动化仪表》 CAS 2015年第5期7-11,18,共6页 Process Automation Instrumentation
基金 国家科技重大专项基金资助项目(编号:2009ZX02207)
关键词 光刻机 宏微耦合模型 机械谐振 递阶辨识 动态响应性能 Lithography Macro-micro coupling model Mechanical resonance Hierarchical recognition Dynamic response
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