脉冲偏压占空比对复合离子镀(Cr,Al)N薄膜结构和力学性能的影响

Impact of duty-ratio of pulsed bias on structure and properties of the(Cr,Al)N thin films by hybrid ion plating

采用将电弧离子镀与磁控溅射离子镀相结合而得的复合离子镀的方法,分别用高纯Cr作为电弧靶、用高纯Al作为溅射靶,通入氮气和氩气,在高速钢和硅片上沉积(Cr,Al)N薄膜。通过台阶仪、扫描电镜、X射线衍射仪、维氏硬度计等分析和测量手段,研究了不同脉冲偏压占空比条件下(Cr,Al)N薄膜结构和力学性能的变化规律。研究表明,占空比对薄膜的结构和力学性能均有影响,当占空比为40%时,薄膜的沉积速率最大,为12.8 nm/min,用25 g载荷保荷10 s测试的维氏硬度1725 Hv也为实验获得的最大值。

（Cr,Al）N films were deposited on high-speed steel and Si slices by hybrid ion plating technique, which is the combination of arc ion plating and magnetron sputtering ion plating. Chromium and aluminum were used as arc target and sputtered target, respectively, during the deposition process under nitrogen and argon environment. The profiler meter, scanning electron microscopy, X-ray diffraction were employed to investigate the microstructure of the （Cr,Al）N films, and their hardness was measured by the Vicker＇s tester. The results show that the duty-ratio of the pulsed bias has influence on the microstructure and mechanical properties of the （Cr,Al）N films. The maximum deposition rate, 12.8 nm/min, was achieved at a duty-ratio of 40%, under which the film fabricated has the highest hardness, 1725 Hv, measured by using a load of 25 gram and keeping 10 seconds.