纳米压印连续脱模与分段脱模数值模拟研究

Numerical simulation of the continuous and segmented demolding process of the nanoimprint lithography

纳米压印中模板和胶层的脱离是关系到纳米压印质量好坏的关键过程。本文利用Ansys有限元软件对纳米压印的脱模过程进行连续脱模和分段脱模数值模拟,研究胶层脱模过程中的性态变化。获得胶层截面的有效应力分布和最大有效应力随脱模距离不同的发展变化趋势。结果显示连续脱模过程时胶层内最大有效应力总趋势降低,但有波动。为优化脱模过程,本文将脱模位移分为五个阶段进行分段脱模,研究表明分段脱模应力小于连续脱模,更利于保护模板和胶层,减小损耗。

The separation of template and imprinted structure is the key process to the quality of the nanoimprint. In this paper, the continuous and segmented demolding processes were analyzed using the finite element method, the characteristic changes in the demolding process were studied, the distribution of equivalent stress and the development trend at different demolding posi-tions were obtained. The results show that the maximum equivalent stress of the imprinted structure in the continuous demolding process is generally reduced and fluctuated. In order to optimize the demolding process, the demolding displacement was divided into five stages, studies have shown that stress is less than that of the continuous demolding, which is more conducive to protect the template and the imprinted structure, and to reduce wear and tear.