g-C_3N_4/CdMoO_4复合光催化材料的制备及其可见光降解磺胺噻唑

Preparation of g-C_3N_4/CdMoO_4 composite and its photocatalytic activity of sulfathiazole under visible light

制备了不同复合比例的g-C3N4/CdMoO4纳米片状复合光催化材料(CN-CMO)。通过SEM、TEMEDS、XRD、FT-IR、DRS等方法对复合材料CN-CMO的晶体结构、形貌特点、光吸收能力、化学键合情况等进行表征。CN-CMO在可见光下对磺胺噻唑光降解性能的研究结果表明,磺胺噻唑的光降解反应具备表观一级动力学的特点,且降解反应速率常数分别为g-C3N4及CdMoO4材料的3倍和10倍。光催化降解机制的研究表明,CN-CMO光催化活性提高的原因在于g-C3N4和CdMoO4复合后材料中电子与空穴更容易分离;同时,考察光催化过程中催化剂的投加量对光催化活性的影响,发现CN-CMO在质量浓度为1g/L时对磺胺噻唑的光催化降解效果最佳。

The photocatalyst of g-C3N4/CdMoO4nanosheets（CN-CMO）was prepared with different proportions.Its crystal structure,morphology,light absorption capability and chemical bond was characterized with SEM,TEM-EDS,XRD,FT-IR,DRS.The photocatalytic activities of sulfathiazole onto the materials under visible light were investigated.Results showed that the photo-degradation had the obvious characteristics of first-order kinetics.The rate constant for the photo-degradation of sulfathiazole by CN-CMO was at most 3times or 10 times than that of g-C3N4 or CdMoO4,respectively.The increase of photocatalytic activity was due to the easier separation of the electron and hole in the CN-CMO.The photocatalytic activity of CN-CMO was affected by its concentration.The optimal dosage was 1.0g/L.