热氧化法改善光学谐振腔的传输特性(英文)

Improving Transmission Performance of Optical Resonator by Thermal Oxidation

为了改善光学波导较大的侧壁粗糙度,探究分次氧化工艺相比于单次氧化工艺的优势,运用微机电系统(MEMS)工艺制备了绝缘体上硅环型谐振腔和跑道型谐振腔,并通过单次氧化工艺和二次氧化工艺对其进行优化处理。理论分析并仿真了粗糙度、散射损耗和光学谐振腔传输特性之间的关系。实验结果显示,相同的氧化深度下,相比单次氧化工艺,二次氧化工艺获得了较窄的半峰全宽(FWHM)、较高的品质因数(Q)和较低的传输损耗。研究结果为波导表面光滑研究提供了重要的参考依据,同时对于高Q值、低损耗谐振腔的制备及其在滤波器、生物传感和光学陀螺等相关领域中的应用具有重要的研究意义。

For improving the larger sidewall roughness of an optical waveguide and exploring the advantages of fractionated oxidation over a single oxidation process, silicon-on-insulator ring and racetrack cavities are prepared using microelectro-mechanical system （MEMS） technology. The silicon-on-insulator ring and racetrack cavities are optimized by single and double oxidation processes, respectively. The relationships among the roughness, scattering loss, and transmission characteristics of an optical resonator are theoretically analyzed and simulated. The experimental results show that, a narrower full-width at half-maximum （FWHM）, higher quality factor （Q）, and lower transmission loss are achieved by the double oxidation process, compared with those achieved by the single oxidation process, for the same oxidation thickness. This result provides a reference for surface-smoothing research and has a significant influence on the preparation and application of cavities with high Q and low transmission loss in filters, biosensors, optical gyroscopes, and other related fields.