In-Situ Rs and Improvement in Thermal Stability of Nickel Silicides Using Different Interlayer Films
In-Situ Rs and Improvement in Thermal Stability of Nickel Silicides Using Different Interlayer Films
出处
《材料科学与工程（中英文A版）》
2015年第3期164-170,共7页
Journal of Materials Science and Engineering A
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