摘要
利用两种不同重均分子量的改性酚醛树脂(PF)与一种三个酯化度的四羟基二苯甲酮―重氮萘醌磺酸酯光敏剂(PAC)按比例配制,加入适量助剂优化感光性能,制备出一种应用于电子触屏加工领域的I-line正性光刻胶,其具有刻蚀精度高、工艺性能优良、单位成本较低等优势特点。
The I-line positive photoresist was prepared by mixing two kinds of modified phenolic resins （PF） with different weight-average molecular weight and hydroxybenzophenone-diazonaphthoquinone-sulfonyl sulfonate （PAC） based on a proper mass ratio. To optimize the photographic property, several additives were added to this mixture. The presented photoresist had advantage of high resolution, desirable processing property and low investment cost, making it an appropriate candidate for electronic touch screen processing etc.
出处
《广州化学》
CAS
2015年第2期1-6,共6页
Guangzhou Chemistry
关键词
酚醛树脂
重氮萘醌磺酸酯
光刻胶
phenolic resins
2-diazo-l-naphthoquinone-5-sulfonyl sulfonate
l-line
photoresist
