摘要
The films composed of carbon nanowalls and diamond nanoplatelets,respectively,can be simultaneously formed on graphite substrate by controlling the hydrogen etching rate during microwave plasma chemical vapor deposition.To modulate the etching rate,two kinds of substrate design were used：a bare graphite plate and a graphite groove covered with a single crystal diamond sheet.After deposition at 1200℃ for 3 hours,we find that dense diamond nanoplatelets were grown on the bare graphite,whereas carbon nanowalls were formed on the grooved surface,indicating that not only reaction temperature but also etching behavior is a key factor for nanostructure formation.
The films composed of carbon nanowalls and diamond nanoplatelets,respectively,can be simultaneously formed on graphite substrate by controlling the hydrogen etching rate during microwave plasma chemical vapor deposition.To modulate the etching rate,two kinds of substrate design were used：a bare graphite plate and a graphite groove covered with a single crystal diamond sheet.After deposition at 1200℃ for 3 hours,we find that dense diamond nanoplatelets were grown on the bare graphite,whereas carbon nanowalls were formed on the grooved surface,indicating that not only reaction temperature but also etching behavior is a key factor for nanostructure formation.
基金
supported by the Public Welfare Technology Application Projects of Zhejiang Province,China(No.2013C33G3220012)
