GaAsMIS肖特基结的GaAs-MgO界面层的电学性质
摘要
使用分子束外延(MBE)技术生长Be掺杂的GaAs膜层,在此基础上,制备Au/GaAs Schottky二极管.另外,在Au与GaAs之间用原子层沉积技术(ALD) 插入一层MgO绝缘层,研究不同掺杂浓度的GaAs对势垒高度及影响因子的影响,实验结果表明,Au/MgO/GaAs结构的肖特基势垒,随着掺杂浓度的升高而增大,影响因子呈现先降低后增加的趋势.
参考文献14
-
1J. F. Fan, H. Oigawa and Y. Nannichi, The Effect of(NH4)2S Treatment on the Interface Characteristics ofGaAs MIS Structures[J]. Jpn. J. Appl.Phys. 27 (1988)1331-1333.
-
2H. Hasegawa, M. Akazawa, K. Matsuzaki, H. Ishii andH. Ohno, GaAs and In0.53Ga0.47As MIS Structures Havingan Ultrathin Pseudomorphic Interface Control Layer ofSi Prepared by MBE[J]. Jpn. J. Appl. Phys. 27 (1988)2265-2267.
-
3S. Ashok, J.M. Borrego, R.J. Gutmann, Electrical characteristics of GaAs MIS Schottky diodes[J]. Solid-StateElectronics. 22 (1979) 621-631.
-
4T. Ito and Y. Sakai, The GaAs inversion-type MIS transistors[J]. Solid-State Electronics, 17 (1974) 751-759.
-
5K. Kamimura and Y. Sakai, The properties of GaAs-Al2O3 and InP-Al2O3 interfaces and the fabrication ofMIS field-effect transistors[J]. Thin Solid Films, 56 (1979)215-223.
-
6Z. Chen, D. Gong, Physical and electrical properties of aSi3N4/Si/GaAs metal-insulator-semiconductor structure[J]. J. Appl.Phys, 90 (2001) 4205-4210.
-
7P. D. Ye, G. D. Wilk, J. Kwo, B. Yang, H.-J. L. Gossmann, M. Frei, S. N. G. Chu, J. P. Mannaerts, M. Sergent, M. Hong, K. K. Ng and J. Bude, Interfacial characteristics of Al/Al2O3/ZnO/n-GaAs MOS capacitor, IEEEElectron Dev. Lett, 24 (2003) 209-211.
-
8C. Liu, Y. M. Zhang, Y. M. Zhang and H. L. Lv, Physical and electrical properties of a Si3N4/Si/GaAs metalinsulator-semiconductor structure[J]. Chin. Phys. B, 22(2013) 076701.
-
9A. Chen, M. Young, W. Li, T. P. Ma-and J. M. Woodall,Metal-insulator-semiconductor structure on low-temperture grown GaAs[J]. Appl. Phys. Lett. 89 (2006)233514.
-
10J. F. Zheng, W. Tsai, W. P. Li, X. W. Wang and T. P.Ma, Demonstration of enhancement-mode GaAs metalinsulator-semiconductor field effect transistor withchannel inversion using Si3N4 as gate dielectric[J]. Appl.Phys. Lett. 92 (2008) 232904.
-
1程萍,田永涛,王文闯,徐玉睿,何豪,王新昌,李新建.ZnO纳米线阵列/p-Si异质结的合成及其整流特性[J].郑州大学学报(理学版),2011,43(3):87-90. 被引量:1
-
2林海安,吴冲若.聚酰亚胺LB膜MIS结构C-V特性[J].材料研究学报,1994,8(1):88-92. 被引量:1
-
3范垂祯,陈宇.GaAs-Al_x Ga_(1-x)As异质结的SIMS定量分析[J].真空科学与技术学报,1991,22(2):105-109. 被引量:1
-
4姜燕,沈坚,张伟.外加载荷对镀Pt探针与ZnO纳米棒接触电学特性的影响[J].南京航空航天大学学报,2011,43(6):837-840.
-
5刘红侠,吴笑峰,胡仕刚,石立春.Characteristics and parameter extraction for NiGe/n-type Ge Schottky diode with variable annealing temperatures[J].Chinese Physics B,2010,19(5):530-535.
-
6朱慧,张迎俏,汪鹏飞,白子龙,孟晓,陈月圆,祁琼.铁酸铋薄膜在小于矫顽电压下的阻变机制[J].北京工业大学学报,2017,43(3):443-447.
-
7刘奇斌,宋志棠,吴良才,封松林.锗纳米晶浮栅存储器的电荷存储特性[J].功能材料与器件学报,2007,13(2):145-149.
-
8苗振华,龚政,方志丹,倪海侨,牛智川.GaAs(331)A衬底上分子束外延生长自组织InAs纳米结构形貌演化机制[J].红外,2004,25(9):1-5.
-
9M.A.Yeganeh,R.K.Mamedov,A.J.Novinrooz.Nano inhomogeneity effects on small Ag/n-Si Schottky diode parameters at high temperature[J].Journal of Semiconductors,2013,34(8):8-14.
-
10林志琦,李会杰,郎永辉,尹福昌.用四象限光电探测器获得光斑参数[J].光学精密工程,2009,17(4):764-770. 被引量:28