期刊文献+

GaAsMIS肖特基结的GaAs-MgO界面层的电学性质

下载PDF
导出
摘要 使用分子束外延(MBE)技术生长Be掺杂的GaAs膜层,在此基础上,制备Au/GaAs Schottky二极管.另外,在Au与GaAs之间用原子层沉积技术(ALD) 插入一层MgO绝缘层,研究不同掺杂浓度的GaAs对势垒高度及影响因子的影响,实验结果表明,Au/MgO/GaAs结构的肖特基势垒,随着掺杂浓度的升高而增大,影响因子呈现先降低后增加的趋势.
出处 《纳米科技》 2015年第3期12-15,共4页
  • 相关文献

参考文献14

  • 1J. F. Fan, H. Oigawa and Y. Nannichi, The Effect of(NH4)2S Treatment on the Interface Characteristics ofGaAs MIS Structures[J]. Jpn. J. Appl.Phys. 27 (1988)1331-1333.
  • 2H. Hasegawa, M. Akazawa, K. Matsuzaki, H. Ishii andH. Ohno, GaAs and In0.53Ga0.47As MIS Structures Havingan Ultrathin Pseudomorphic Interface Control Layer ofSi Prepared by MBE[J]. Jpn. J. Appl. Phys. 27 (1988)2265-2267.
  • 3S. Ashok, J.M. Borrego, R.J. Gutmann, Electrical characteristics of GaAs MIS Schottky diodes[J]. Solid-StateElectronics. 22 (1979) 621-631.
  • 4T. Ito and Y. Sakai, The GaAs inversion-type MIS transistors[J]. Solid-State Electronics, 17 (1974) 751-759.
  • 5K. Kamimura and Y. Sakai, The properties of GaAs-Al2O3 and InP-Al2O3 interfaces and the fabrication ofMIS field-effect transistors[J]. Thin Solid Films, 56 (1979)215-223.
  • 6Z. Chen, D. Gong, Physical and electrical properties of aSi3N4/Si/GaAs metal-insulator-semiconductor structure[J]. J. Appl.Phys, 90 (2001) 4205-4210.
  • 7P. D. Ye, G. D. Wilk, J. Kwo, B. Yang, H.-J. L. Gossmann, M. Frei, S. N. G. Chu, J. P. Mannaerts, M. Sergent, M. Hong, K. K. Ng and J. Bude, Interfacial characteristics of Al/Al2O3/ZnO/n-GaAs MOS capacitor, IEEEElectron Dev. Lett, 24 (2003) 209-211.
  • 8C. Liu, Y. M. Zhang, Y. M. Zhang and H. L. Lv, Physical and electrical properties of a Si3N4/Si/GaAs metalinsulator-semiconductor structure[J]. Chin. Phys. B, 22(2013) 076701.
  • 9A. Chen, M. Young, W. Li, T. P. Ma-and J. M. Woodall,Metal-insulator-semiconductor structure on low-temperture grown GaAs[J]. Appl. Phys. Lett. 89 (2006)233514.
  • 10J. F. Zheng, W. Tsai, W. P. Li, X. W. Wang and T. P.Ma, Demonstration of enhancement-mode GaAs metalinsulator-semiconductor field effect transistor withchannel inversion using Si3N4 as gate dielectric[J]. Appl.Phys. Lett. 92 (2008) 232904.

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部