住院3次以上双相障碍与精神分裂症患者住院特征比较

Comparison of hospitalization characteristics for the revolving-door patients with schizophrenia and bipolar disorder

目的:分析比较住院≥3次双相障碍与精神分裂症患者的住院特征。方法:对210例住院≥3次的精神分裂症患者和203例双相障碍患者的住院资料进行回顾性分析,对两组住院周期和出院间隔进行比较。结果:随住院次数增加,精神分裂症患者和双相障碍患者平均住院周期分别从首次的(73.6±48.8)d和(65.7±47.3)d逐渐延长至第8次住院之后的(119.7±116.0)d和(75.9±68.9)d;平均出院间隔逐渐缩短;与精神分裂症相比,双相障碍患者住院周期稍短(P<0.05),而出院间隔相当(P>0.05)。结论:双相障碍与精神分裂症患者病程总体相似,反复发作频率相当。

Objective：The aim of the study was to compare the characteristics of hospitalization of the pa-tients with schizophrenia versus bipolar disorder,who had at least 3 times of previous admission. Method：We had retrospectively summarized the clinical data of patients with schizophrenia（ n=210 ）and bipolar disorder （n=203）,who had at least 3 times of previous admission before,comparing the length of stay and the interval between readmissions of the two groups. Resuits：With the number of hospitalization increasing,the length of stay in hospital of the patients with schizophrenia and bipolar disorder prolonged,from（73. 6 ± 48. 8）days and （65. 7 ± 47. 3）days at the first admission to（119. 7 ± 116. 0）days and（75. 9 ± 68. 9）days respectively at the 8th admission. The interval between re-admissions gradually reduced. Compared to schizophrenia,patients with bipolar disorder had shorter average length of stay（P〈0. 05）,and no significant differences of the inter-val between re-admissions（P 〉0. 05）. Conciusion：Patients with bipolar disorder and schizophrenia have generally similar course of disease,and almost the same onset frequency.