热电制冷膜蒸馏性能及数值模拟分析

Thermoelectric refrigeration membrane distillation performance and numerical simulation analysis

为提高膜蒸馏传质过程效率,在新型热电制冷平板式膜蒸馏组件的基础上,对新型半导体冷腔的制冷性能进行分析,通过对具有不同旋向结构参数的热容腔数值模拟计算,获得2mm小空间膜热容腔近膜面处的流场和温度场,比较分析不同边界层涡量值和温度梯度,数值计算结果表明:具有开槽宽度3 mm,角度60°的分水盘的涡量值为0.088(1/s),温度梯度0.02℃/mm,该结构削弱了膜面处边界层的温度极化和浓度极化,为研究提高膜蒸馏传质通量方法的物理机制奠定了基础.

In order to improve the membrane distillation and its mass transfer efficiency, basesd on the new thermoelectric refrigeration of flat plate type membrane distillation this article analyzes the performance of the new cold chamber semiconductor. After a numerical simulation analysis of heat fault cavity with different handed structure parameters, a 2 mm membrane heat fault cavity flow field and temperature field were obtained. Different value of boundary layer vortices and temperature gradient was comparatively analysed. The simulated results show that the vortices value of water disk with a groove width of 3 mm and 60° angle diversion is 0. 088 （1/s）, and the temperature gradient is 0. 02 ℃/mm, it weakens the temperature polarization and concentration polarization of outside the boundary layer at the membrane surface, and lays the foundation for improving the membrane distillation and for the physical mechanism of its mass transfer fluxes methods.