摘要
电弧离子镀工艺中,弧斑的放电形式、运动速率、运动方式的控制对于减少以至消除大颗粒的发射至关重要。本文采用自主研发的机械式旋转磁控弧源,围绕三种不同模式的旋转磁场下弧斑的放电行为及规律进行了研究,并从弧斑放电的物理机制出发,分析讨论了不同模式的旋转磁场对阴极斑点运动的影响机理。研究结果表明,多模式旋转磁场可以有效提高弧斑的运动速度、扩大放电面积、降低放电功率密度、减少大颗粒的发射,同时还能够大幅度提高靶材的利用率,拓展电弧离子镀的应用。
The impact of the rotating modes of magnetic field on the am-spot trajectory in arc ion plating was ap- proximated, modeled, simulated in finite dement method (FEM), and measured with a lab-biult arc-source controlled by mechanically rotating magnetic field, to effectively eliminate macro-particle emssion. The permanent magnet conflgura- dons,responsible for rotating modes of magnetic field,include Mode-I,a monopole of permanent magnet siting at 1/2 R away from the rotating axis; Mede-II, magnetic quadmpoles of two pairs of N- and S-poles with the center situated at about 1/3 R from the axis;and Mode-III,a circular array of S-poles surrounding an N-pole fixed at about 1/3 R away from the axis. The simulated and measured results show that the rotating modes significantly affect the trajectary of the am-spot to a varying degree.To be specific, the multi-mode rotating of magnetic field increases the velocity of am-spot, enlarges the discharge area, decrease the discharge power density, curbs the macro-particle emission, strongly enhances the target utilization-ratio, and widens application of arc ion plating technology in film growth.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2015年第6期662-670,共9页
Chinese Journal of Vacuum Science and Technology
基金
浙江省自然科学基金项目(LQ12E01003)
浙江省科技厅公益计划项目(2012C21099)
关键词
机械式旋转磁控弧源
旋转不对称偏心轴向磁场
旋转偏心横向磁场
旋转偏心四极对顶磁场
旋转偏心拱形磁场
Mechanical rotating magnetic field assisted arc source, Rotating asymmetric and offset axial magnetic field, Rotating offset transverse magnetic field, Rotating offset quadrupole (four poles) antipodal mag-netic field, Rotating offset arched magnetic field