多模式旋转磁场对电弧离子镀弧斑放电的影响分析

Effect of Magnetic Field Rotating in Multi-Mode on Arc-Spot Discharge in Arc Ion Plating

电弧离子镀工艺中,弧斑的放电形式、运动速率、运动方式的控制对于减少以至消除大颗粒的发射至关重要。本文采用自主研发的机械式旋转磁控弧源,围绕三种不同模式的旋转磁场下弧斑的放电行为及规律进行了研究,并从弧斑放电的物理机制出发,分析讨论了不同模式的旋转磁场对阴极斑点运动的影响机理。研究结果表明,多模式旋转磁场可以有效提高弧斑的运动速度、扩大放电面积、降低放电功率密度、减少大颗粒的发射,同时还能够大幅度提高靶材的利用率,拓展电弧离子镀的应用。

The impact of the rotating modes of magnetic field on the am-spot trajectory in arc ion plating was ap- proximated, modeled, simulated in finite dement method （FEM）, and measured with a lab-biult arc-source controlled by mechanically rotating magnetic field, to effectively eliminate macro-particle emssion. The permanent magnet conflgura- dons,responsible for rotating modes of magnetic field,include Mode-I,a monopole of permanent magnet siting at 1/2 R away from the rotating axis; Mede-II, magnetic quadmpoles of two pairs of N- and S-poles with the center situated at about 1/3 R from the axis;and Mode-III,a circular array of S-poles surrounding an N-pole fixed at about 1/3 R away from the axis. The simulated and measured results show that the rotating modes significantly affect the trajectary of the am-spot to a varying degree.To be specific, the multi-mode rotating of magnetic field increases the velocity of am-spot, enlarges the discharge area, decrease the discharge power density, curbs the macro-particle emission, strongly enhances the target utilization-ratio, and widens application of arc ion plating technology in film growth.