磁控溅射V-Al-Ta-N四元涂层结构和性能研究

Synthesis and Characterization of Magnetron Sputtered V-Al-Ta-N Coatings

利用磁控溅射法制备出不同成分的(VAl)_(1-x)Ta_xN涂层,用X射线衍射、扫描电镜、原子力显微镜表征涂层微观结构,利用纳米压痕仪和摩擦磨损试验机测试了Ta含量对涂层的力学性能和摩擦磨损性能的影响。研究表明:Ta含量x≤0.31时,涂层为(111)结构,且硬度较低;当x≥0.57时,(111)结构完全消失,涂层呈现(200)择优取向,此时涂层变得较为致密,硬度和模量均得到明显提升,韧性也有显著提高。摩擦磨损实验表明Ta含量的增加能够降低涂层的摩擦系数,但同时也会增大涂层的磨损率。

The quaternary （VAI）1-xTaxN coatings were deposited by reactive magnetron co-sputtering on substrate of Coming Eagle glass. The impact of the growth conditions,including but not limited to the Ta-doping, sputtering power, substrate temperature and ratio of Ar/N2 flow rates,on the microstructures and mechanical properties of the coatings were investigated with X-my diffraction, scanning electron microscopy, atomic force microscopy and conventional mechanical probes. The resuhs show that the Ta-content significantly affects the mechanical properties of the 〈 200 〉 preferentially oriented coatings. For instance, as the Ta-content increased from below x ≤0.31 to above x ≥ 0.57, the dominated （111） preferentially oriented cubic VN turned completely into 〈 200 〉 oriented cubic TaN, accompanied by significantly increasing hardness,modulus, toughness, and compactness, but strongly decreasing wear-resistance and friction coefficient. Possible mechanisms responsible for the changes in its mechanical and tribological behavior were also tentatively discussed.