摘要
采用辉光放电质谱法(GD-MS)测定高纯钴中Na、K、Fe、Ni、Cu等14个痕量杂质元素。找出了合适的样品预处理方法,讨论了最佳仪器工作参数和样品预溅射时间的选择,探讨了如何选择合适的分析同位素及分辨率模式来减小同位素干扰的影响。分析了GD-MS测定痕量杂质元素的精密度,并将分析结果与高纯钴样品出厂标定值进行比对以验证GD-MS无标直接分析的准确程度。结果表明,辉光放电质谱法是直接分析高纯钴材料的有效分析方法。
ABSTRACT : Na, K, Fe, Ni, Cu and the other nine trace impurity elements in high purity cobalt is determined by glow discharge mass spectrometry (GD-MS). The proper pretreatment method of samples are found out, the optimal instruments working parameters and sample presputter time is discussed, as well as how to select the proper analysis isotopes and resolution models to decrease the isotopes inter- feting effect. The precision degree of trace impurities elements determined by GD-MS is analyzed, and the analysis results are compared to the factory calibration value to test the accuracy degree of GD-MS direct analysis without calibration. The results show glow discharge mass spectrometry is the effect analysis method for direct analysis of high purity cobalt materials.
出处
《云南冶金》
2015年第3期61-65,共5页
Yunnan Metallurgy
关键词
辉光放电质谱法
高纯钴
痕量元素
KEY WORDS: glow discharge mass spectrometry
high purity cobalt
trace elements