退火温度对p型CuCrO_2薄膜结构与光学性能的影响

Effect of annealing temperature on structure and transmittance properties of p-type CuCrO_2 film

采用射频磁控溅射法在石英玻璃衬底上制备CuCrO2薄膜,研究退火温度对CuCrO2薄膜结构和光学性能的影响。结果表明:未经退火处理的CuCrO2薄膜为非晶态,颗粒较小,可见光透射率仅为56%。退火处理能够改善CuCrO2薄膜的结构和透光性能。随着退火温度的升高,薄膜结晶化程度逐渐增强,孔洞缺陷逐渐减少,薄膜逐渐变得平整致密,薄膜的透光性能得到改善,薄膜的吸收边向短波方向移动。当退火温度为800℃时,薄膜的性能最优,可见光透射率达到70%。光学带隙宽度为3.06eV。

CuCrO2 films were prepared by the radio frequency magnetron sputtering method on the quartz glass substrate. The effects of annealing temperature on the structure and optical properties of CuCrO2 films were investigated. The results show that the as-deposited CuCrO2 film is amorphous, in which particle is small, and its transparence in visible light is only 56%. Annealing treatment can improve the structure and optical properties of CuCrO2 films. With the annealing temperature increasing, the crystallization degree of CuCrO2 films increases, and the density of pore defects decreases, respectively. The films become smooth and compact gadually, and the light transmittance of the films increases with the increasing annealing temperature, the absorption edge of the films moves toward the short wavelength. When the annealing temperature is 800℃, the film has the best transmittance property, its transparence in visible light is 70%, and the optical band gab is about 3.06 eV.