Al衬底取向与ZnO薄膜织构的关系

Relationship between Crystallographic Orientation of Al Substrate and Texture of ZnO Thin Film

以发生了二次再结晶的高纯Al为衬底材料,采用射频磁控溅射法制备了ZnO薄膜。研究了溅射工艺及Al衬底取向对ZnO薄膜的影响,分析了Al衬底取向与ZnO薄膜织构的关系。结果显示,当溅射工艺恰当时,高纯Al衬底上可以制备出晶态ZnO薄膜,但Al衬底的取向对ZnO薄膜的结晶性具有更大的影响。Al衬底的轧面上主要为{100}面织构,沉积的ZnO薄膜主要是{0002}面织构和少量的{112—0}面织构组分。

ZnO thin films were magnetron sputtering method prepared on the secondary Both the influence of the substrate to the ZnO thin films were investigated and recrystallization high purity A1 substrate by rf sputtering process and the orientation of A1 the corresponding relationships between the orientation of A1 substrate and the texture of ZnO thin films were analyzed. Results indicate that crystalline ZnO films can be prepared on the high purity A1 substrate by the appropriate sputtering process. However, the crystallinity of ZnO films mainly depends on the orientation of A1 substrate. There are mainly the { 100 } planes on the A1 substrate, and deposited ZnO films are mainly { 0002 } planes and slightly { 1120 } planes on it.