摘要
阴极保护技术是金属腐蚀与防护的主要技术之一,光致阴极保护技术作为一种新型的阴极保护技术近年来受到国内外学者的广泛关注。半导体薄膜在光致阴极保护过程中可作为永久性防护涂层,其中TiO2因具有独特的光电性能、良好的稳定性及无毒廉价等特点,在光致阴极保护技术中更具优势。综述了光致阴极保护技术的优越性,重点论述了TiO2光致阴极保护薄膜的制备及其在光致阴极保护技术领域的研究现状,提出了目前存在的问题及未来发展的方向。
Cathodic protection technology is one of the main technologies of metal corrosion and protection. As a new technology of cathodic protection, photo-cathodic protection technology is widely concerned in recent years by domestic and foreign scholars. Semiconductor films can be used as a permanent protective coating in photo-cathodic protection process. TiO2 has more advantages in photo-cathodic protection technology because its unique photoelectric properties, good stability, nontoxic and cheap characteristics. This paper reviews the superiority of photo-cathodic protection technology, focuses on the preparation and research status of TiO2 film in the field of photo-cathodic protection, puts forward the existing problems and development direction in the future.
出处
《腐蚀与防护》
CAS
北大核心
2015年第3期250-257,共8页
Corrosion & Protection
基金
国家自然科学基金(21266006)
广西自然科学基金(2012GXNSFAA053034)
