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铜表面硅烷-稀土掺杂膜的制备及缓蚀性能 被引量:4

Preparation and Corrosion Inhibition of the Silane-Rare Earth Doped Film for the Copper
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摘要 运用分子自组装技术在铜片表面组装γ-巯丙基三甲氧基硅烷(MPTS)与稀土的掺杂膜。用原子力显微镜(AFM)观察了铜表面成膜过程,用金相显微镜观察铜片在0.5mol/L盐酸溶液中腐蚀72h后的表面形貌,运用电化学测量法对其防腐蚀性能进行评价。结果表明,硅烷-稀土掺杂膜对铜的缓蚀效率较单一的硅烷膜有明显提高,稀土浓度及组装时间对掺杂膜抗腐蚀性能有一定影响。经过极化曲线和交流阻抗的测定,确定硅烷-稀土掺杂膜的最佳组装条件为:LaCl3质量浓度为10g/L,组装30min,缓蚀率达93%。 Self-assembled monolayer of silane-rare earth was fabricated on copper surface by molecular self-as-sembly process.Atomic force microscope (AFM)was used to characterize the film surface,and metallography micro-scope was used to characterize the copper surface after corroding in 0.5 mol/L HCl solution for 72 h.The corrosion inhibition performance of the silane-rare earth SAMs was examined by electrochemical methods.The results indicate that the doped film′s corrosion inhibition ability is obvious improved compared with silane film.The assembled time and the concentration of rare earth also affect the corrosion resistance.By potentiodynamic polarization curves and electrochemical impedance spectroscopy,the film assembled at 10 g/L concentration of LaCl3 for 30 min possess the best inhibition efficiency reaches 93%.
出处 《材料导报》 EI CAS CSCD 北大核心 2015年第12期23-27,36,共6页 Materials Reports
基金 国家自然科学基金(21176030) 辽宁省教育厅优秀人才支持计划(LR2011033)
关键词 硅烷-稀土 掺杂膜 电化学 缓蚀 silane-rare earth doped film electrochemical corrosion inhibition
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