摘要
The influence of water vapor on silica membrane with pore size of ,-4A has been investigated in terms of adsorption properties and percolation effect at 50 and 90 ℃. Two methods are employed： spectroscopic ellipsometry for water vapor adsorption and gas permeation of binary mixture of helium and H2O The adsorption behaviors on the silica membrane comply with the first-order Langmuir isotherm. The investigation demonstrates that helium flux through the silica membrane decreases dramatically in presence of H20 molecules. The transport of gas molecules through such small pores is believed not to be continuous any more, whereas it is reasonably assumed that the gas molecules hop from one occupied site to another unoccupied one under the potential gradient. When the coverage of H20 molecules on the silica surface increases, the dramatic decrease of helium flux could be related to percolation effect, where the adsorbed H20 molecules on the silica surface block the hopping of helium molecules.
基金
This work was supported by the Fhndamental Research Funds for the Central Universities （No.XDJK2015C002） and the National Natural Science Foundation of China （No.51402243）. Special thanks are given to Prof. H. J. M Bouwmeester and Dr. N.E. Benes from University of Twente for fruitful discussion.
