摘要
综述了Ti-Ni形状记忆合金(SMA)薄膜的制备、特性及应用的研究现状。介绍了影响Ti-Ni SMA薄膜性能的相关因素及磁控溅射和熔体快淬两种Ti-Ni基SMA薄膜的制备方法,论述了Ti-Ni基SMA薄膜在微机电系统中的应用。最后,指出了Ti-Ni SMA薄膜存在的问题及今后的研究方向。
The research status of the fabrication, properties and applications of Ti-Ni shape memory alloy（SMA） thin films were reviewed. The influencing factors of the properties of Ti-Ni SMA thin films and the two preparation methods of the magnetron sputtering deposition and the fast melt quenching for the thin films were mainly introduced. The applications of Ti-Ni SMA thin films in micro-electro-mechanical system were discussed and lastly the problems and future researching direction of Ti-Ni SMA thin films were presented.
出处
《铸造技术》
CAS
北大核心
2015年第6期1346-1349,共4页
Foundry Technology
基金
陕西省大学生创新创业训练计划资助项目(1628)
陕西省教育厅科研计划资助项目(12JK0436)
关键词
Ti-Ni形状记忆合金薄膜
磁控溅射
熔体快淬
微机电系统
Ti-Ni shape memory alloy film
magnetron sputtering
melt spinning
micro-electro-mechanical system
