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退火处理对二氧化锡纳米线性能的影响

Effects of Thermal Annealing on Properties of SnO_2 Nanowires
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摘要 采用化学气相沉积法在硅衬底上生长二氧化锡(SnO2)纳米线,并对其进行热处理。扫描电子显微镜、X射线衍射仪和拉曼光谱测试分析表明所合成的SnO2纳米线为单一四方金红石相,且结晶性能良好。光致发光测试显示在576nm附近有明显的黄色发光峰,但在氧气氛环境退火处理后该发光峰逐渐减弱,表明576nm处的发光峰为氧空位缺陷引起的发光。同时,退火处理能有效提高材料的场发射性能,SnO2纳米线的最低开启和阈值电场分别约为4.6和6.2V/μm。 Tin oxide(SnO2)nanowires were synthesized on silicon substrate using chemical vapor deposition method.Scanning electron microscopy,X-ray diffraction and Raman spectrum analysis reveal that the as-synthesized SnO2 nanowires exhibit single crystalline in tetragonal rutile structure.Photoluminescence spectra of SnO2 nanowires show a strong emission peaked at576 nm. However,the 576 nm emission gradually decreases with the increase of oxygen concentration during the thermal annealing, indicating the oxygen-related emission.Furthermore,the field emission properties of SnO2 nanowires get enhanced after annealing.The lowest turn-on and threshold field are 4.6and 6.2V/μm,respectively.
出处 《半导体光电》 CAS 北大核心 2015年第3期425-430,共6页 Semiconductor Optoelectronics
基金 国家自然科学基金项目(51102098)
关键词 SnO2纳米线 退火处理 光学性能 场发射性能 SnO2 nanowires thermal annealing optical property field emission property
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