GaN-MOCVD设备MO源注入摩尔流量的精确控制

Accurate Control of MO Source Injected Mol Flow of GaN-MOCVD

分析了GaN-MOCVD设备中MO源注入摩尔流量控制的基本原理,给出了决定MO源注入摩尔流量的三个重要条件,然后针对于Ga N-MOCVD中5种常用的金属有机源,根据工艺生长的需要,分别给出了MO源注入摩尔流量精确控制的解决方案。

The article analyses basic principle of control of MO source injected mol flow of Ga N-MOCVD,and gives three important condition of decided MO Source Injected Mol Flow. Then to five familiar metal organic source of Ga N-MOCVD, based of demand of technology growth,respectively gives solution of accurate control of MO source injected mol flow.