交流双极脉冲磁控溅射电源研制及ZnO:Al透明薄膜制备

AC Bipolar Pulsed Magnetron Sputtering Power Supply and Preparation of ZnO:Al Transparent Films

设计一台高性能的交流双极脉冲电源,用于驱动反应式磁控溅射靶机在透明基底上制备Zn O:Al薄膜。对电源的输出电压、电流、等离子体放电特性和光电辐射光谱特性进行测试,讨论不同工作气压对电源电气特性的影响。实验结果表明,该电源多变量可控,具备良好的电弧削弱能力,可驱动磁控溅射靶机在活性气体环境中制备出高沉积率的Zn O:Al透明薄膜。系统结构简单,性价比高,具有较强的市场推广能力。

The paper designs a high performance AC bipolar pulsed generator, which is used to drive a reactive magnetron sputtering reactor to deposit thin films of Zn O：Al on transparent substrates. Voltage, current, plasma discharge and optical spectroscopy measurements were performed to test the power supply. The electrical characteristics at different pressures are also discussed. Study shows that the ac bipolar pulsed generator, with several adjustable parameters, is able to operate with reactive magnetron sputtering system to fabricate high quality transparent films with a high deposition rate. During the process arcing discharge events are minimized. The generator proposed is simple and inexpensive, and can promote in a wide market sectors.