GH3535合金700℃恒温氧化行为研究

Isothermal Oxidation Behavior of GH3535 Superalloy at 700 °C

利用增重法,研究了GH3535合金在700℃/700 h下的恒温氧化行为。采用扫描电镜(SEM)、X射线衍射(XRD)、电子探针(EPMA)和同步辐射荧光(SRXRF)分析技术研究了GH3535合金高温氧化膜的氧化动力学、形貌及氧化物的组成。结果表明,GH3535合金在700℃/700 h氧化后表面氧化膜无明显剥落,氧化动力学曲线遵循立方规律,氧化膜厚度为5μm左右,无内氧化现象发生。700℃下,GH3535合金属于完全抗氧化等级。合金表面生成的氧化膜成分以Ni O、Cr2O3、Ni Cr2O4和Ni Mn2O4为主。

Isothermal oxidation kinetics and oxidation mechanism of GH3535 superalloy was studied at 700 °C for 700 h. The morphology and component of the high-temperature oxide scale for GH3535 alloy was analyzed by SEM, XRD, EPMA and SRXRF techniques. The results show that the oxidation kinetics curve of GH3535 alloy follows the cubic law at 700 °C. Thickness of the oxidation film is about 5 μm and internal oxidation does not occur. The oxidation film has no obvious spallation and it is composed of Ni O, Cr2O3, Ni Cr2O4 and Ni Mn2O4.