摘要
采用现代分析方法探讨零价铁(ZVI)与奥奈达希瓦氏菌(S.oneidensis)MR-1还原U(Ⅵ)的效果与机制。结果表明:ZVI与S.oneidensis均能够还原U(Ⅵ);在厌氧条件下,ZVI与S.oneidensis还原U(Ⅵ)存在协同作用。当p H为7、温度为30℃、U(Ⅵ)的初始浓度为20 mg/L、ZVI的投加量为1.0 g/L时,24 h S.oneidensis对U(Ⅵ)还原率达到96.9%;在0.5~2.0 g/L范围内,U(Ⅵ)的还原率随ZVI投量的增加而上升;在U(Ⅵ)初始浓度5.0~50.0mg/L内,U(Ⅵ)的还原率与其浓度正相关。ZVI、Fe3O4和Fe2O3均能明显促进U(Ⅵ)的还原,而可溶态的Fe(Ⅲ)对U(Ⅵ)的还原具有明显的抑制作用。其他离子Cu2+、Ca2+、Mn2+和NO3-对U(Ⅵ)的还原存在抑制作用,以Cu2+的影响最大,Ca2+的影响次之,SO42-对U(Ⅵ)的还原影响较小。XPS分析结果表明,ZVI表面吸附和沉积了U(Ⅵ)和U(Ⅳ)两种价态的U元素,反应后的铀大部分形成了稳定的UO2。
The effects and mechanism of U(Ⅵ) reduction by Shewanella oneidensis (S.oneidensis) MR-1 with zero-valent iron(ZⅥ) were evaluated. The results show that either ZⅥ or bacteria can reduce U(Ⅵ) in the solution and under anaerobic conditions, a cooperative action of ZⅥ and the bacteria S.oneidensis is observed in reducing process of U(Ⅵ). Under condition of pH 7.0, temperature 30 ℃, the initial concentration of U (Ⅵ) 20 mg/L and ZⅥ addition 1.0 g/L, the reduction rate of U(Ⅵ) reaches 96.9% by S.oneidensis reduction for 24 h. The reduction rate of U(Ⅵ) is improved with increasing amount of ZⅥ in the range of 0.5-2.0 g/L, and the reduction rate of U(Ⅵ) is positive correlated with its initial concentration in the range of 5.0-50.0 mg/L. Fe304, FeEO3 and ZⅥ are effective accelerators for bioreduction of U(Ⅵ), and soluble Fe(Ⅲ) can remarkably inhibit U(Ⅵ) bioreduction. The other coexistence ions, such as Cuz+, Ca2+, Mn2+ and NO3-, show a remarkable negative effect on U(Ⅵ) reduction, and among these ions, the negative effect of Cu2+ is the greatest and that of Ca2+ is the second. SO42- has less influence on U(Ⅵ) bioreduction. XPS results indicate the deposition of U element are in forms of U(Ⅵ) and U(IV) on iron filings surface, and the reduction product U(IV) is most likely to be in the form of UO2.
出处
《中国有色金属学报》
EI
CAS
CSCD
北大核心
2015年第8期2309-2315,共7页
The Chinese Journal of Nonferrous Metals
基金
国家自然科学基金资助项目(11175081
11475080)
湖南省自然科学基金资助项目(13JJ3078)
湖南省高校创新平台开放基金项目(14K083)
关键词
零价铁
U(Ⅵ)
奥奈达希瓦氏菌
XPS分析
zero-valent iron ( ZVI)
U(Ⅵ)
Shewanella oneidensis MR-1
XPS analysis