磁控溅射功率对光学氧化钒薄膜结构和性能的影响

Effects of RF Magnetron Sputtering Power on Structure and Properties of the Optical Vanadium Oxide Films

采用射频磁控溅射法制备氧化钒(VOx)薄膜,研究溅射功率对氧化钒薄膜结构、光学及力学性能的影响。利用表面轮廓仪、X射线衍射仪、原子力显微镜、分光光度计、椭偏仪及纳米压痕仪分析在不同溅射功率下制备的氧化钒薄膜的沉积速率、物相结构、表面形貌、紫外-近红外光透射率、折射率、吸光度以及硬度和弹性模量。结果表明,各功率参数下沉积的氧化钒薄膜的光透射率基本都大于80%,属于弱吸收透明膜。随溅射功率的增大,薄膜的沉积速率、硬度和可见光范围内的折射率都单调增大,而表面粗糙度则出现先增大后减小的变化。溅射功率对薄膜的晶体结构也有一定的影响。

Vanadium oxide（VOx） films are deposited by radio frequency（RF） magnetron sputtering. Effects of sputtering powers on structure, optical and mechanical properties of the vanadium oxide films are investigated.Deposition rate, crystalline structure, surface morphology are measured by the profiler, X-ray diffraction, and scanning electron microscopy, respectively. The spectrophotometer, ellipsometer and nano-indenter are employed to test the optical properties such as transmittance, reflective index, absorption, mechanical properties of hardness and elastic modulus. The results show that all of the film samples are transparent with transmittance of more than80% within the optical range. The deposition rate, hardness and refractive indices within the visible range monotonously increase with increasing sputtering power. While surface roughness of the films increases firstly and then decreases with increasing sputtering power. It is found that the sputtering power has influence on the crystalline structure as well.