期刊文献+

火炮身管内壁磁控溅射氮化物层的性能 被引量:3

Properties of Nitride Coatings on Inside Wall of Reinforced Gun Barrel by Magnetron Sputtering
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摘要 为了提高火炮身管的力学硬度和弹性模量,在PCrNi3Mo钢表面磁控溅射了TiAlN,CrAlN2种氮化物防护层。利用激光共聚焦显微镜、X射线衍射仪(XRD)对2种溅射层的形貌及结构进行了表征,采用纳米压痕仪测试了基材与2种溅射层的硬度和弹性模量。结果表明:CrAlN层表面相对平整光滑致密,表面粗糙度较小(R2=0.004~0.006μm),TiAlN层表面粗糙度相对较大(Ra=0.005~0.021μm);CrAlN层表面生成的主晶相为CrN,TiAlN层表面生成的主晶相为TiN,2种晶相分别沿(110)和(200)面呈现择优取向;CrAlN层硬度和弹性模量分别为20.39,288.8GPa,TiAlN分别为14.51,267.70GPa,较基材(5.57,258.00GPa)均有显著提高,其中CrAlN层提高最为显著。 TiAlN and CrAlN protective coatings were deposited on the surface of PCrNi3 Mo steel by magnetron sputtering method.The composition and microstructure of the two coatings were characterized by confocal laser scanning microscope and X- ray diffractometer.The hardness and elastic modulus of the substrate material and the two coatings were measured by nano-indentation.Results showed that the surface of CrAlN was smooth and dense and the roughness was smaller(R_M =0.004 ~0.006 μm).The surface roughness of TiAlN coating was larger(R_M= 0.005 ~ 0.021 μm).The main crystalline phases of CrAlN and TiAlN coatings were CrN and TiN respectively,and two phases preferrentially orientated along(110) and(200)respectively.The hardness and elastic modulus of CrAlN coating were 20.39 GPa and 288.8 GPa,and those of TiAlN coating were 14.51 GPa and 267.7 GPa,which were much higher than those of the subatrate material(5.57 GPa and 258 GPa).
出处 《材料保护》 CAS CSCD 北大核心 2015年第8期50-52,8,共3页 Materials Protection
基金 辽宁省教育厅科学研究项目(L2012058) 辽宁省教育厅重点实验室基础研究项目(LZ2014013)资助
关键词 磁控溅射 TIALN CRALN 火炮身管 硬度 弹性模量 magnetron sputtering TiAlN CrAlN gun barrel hardness elastic modulus
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参考文献7

  • 1Long Y, Zeng J J, Yu D H. Microstructure of TiA1N and CrAIN coatings and cutting performance of coated silicon nitride inserts in cast iron turning [ J ]. Ceramics Interna- tional,2014,40(7) :9 889 -9 894.
  • 2Bobzin K, Bagcivan N,Ewering M. DC-MSIP/HPPMS (Cr,Al,V) N and (Cr,Al,W)N thin films for high-temperature friction reduction [ J ]. Surface and Coatings Technology, 2011,205(8/9) :2 887 -2 892.
  • 3Kulkarni A P, Joshi G G, Sargade V G. Dry turning of AISI 304 austenitic stainless steel using A1TiCrN coated insert produced by HPPMS technique[ J]. Proeedia Engineering, 2013,64:737 - 746.
  • 4张以忱.真空镀膜技术[M].北京:冶金工业出版社,2011 ,82.
  • 5郑康培,刘平,李伟,马凤仓,刘新宽,陈小红,杨丽红.Al含量对CrAlN涂层微观结构和力学性能的影响[J].真空科学与技术学报,2011,31(6):686-690. 被引量:19
  • 6Makino Y, Nogi K. Synthesis of pseudobinary Cr-AI-N films with BI structure by d-assisted magnetron sputtering meth- od [ J ]. Surface and Coatings Technology, 1998,98 ( 1 - 3 ) : 1 008-1 012.
  • 7张以忱,吴宇峰,巴德纯,马胜歌.工艺参数对非平衡磁控溅射Ti/TiN/Ti(C,N)薄膜硬度的影响[J].钢铁研究学报,2007,19(7):50-53. 被引量:6

二级参考文献18

  • 1卢国英,林国强.脉冲偏压电弧离子镀CrAlN薄膜研究[J].真空科学与技术学报,2006,26(6):441-445. 被引量:20
  • 2张德元,彭文屹,许兰萍,杨春燕,邓鸣,罗文.TiAlN与TiCN系涂层磨损机理的比较[J].金属热处理,1997,22(2):30-32. 被引量:6
  • 3Mayrhofer P H, Tischler G, Mitterer C, et al. Microstructure and Mechanical/Thermal Properties of Cr-N Coatings Deposited by Reative Unbalanced Magnetron Sputtering[J]. Surface and Coatings Technology, 2001,142-144 : 78-74.
  • 4Munz W D, Lewis D B, Creasey S, et al. Defects in TiN and TiAlN Coatings Grown by Combined Cathodic Arc/Unbalanced Magnetron Technology[J]. Vacuum,1995,4(46):323-330.
  • 5Hsieh J H, Liang C, Yu C H, et al. Deposition and Characterization of TiAlN and Multi-Layered TiN/TiAlN Coating Using Unbalanced Magnetron Sputtering[J]. Surface and Coating Technology, 1998,108-109 : 132-137.
  • 6Jimenez C, Perriere J, Palacio C, et al. Transformation of Titanium Nitride in Oxygen Plasma[J]. Thin Solid Films, 1993, (288) : 247-251.
  • 7Erturk E, Kntek O, Burgmer W, et al. Ti(C,N)' Coatings Using the Arc Process[J]. Surface and Coatings Technology, 1991,46(1) :39-46.
  • 8Karlsson L. Growth Microstructure and Mechanical Properties of Arc Evaporated TiCxN1-x(0≤x≤1) Films[J]. Surface and Coatings Technology, 2000, (126) : 1-14.
  • 9Seog-Young Yoon, Jong-Kuk Kim. A Comparative Study on Tribologieal Behavior of TiN and TiAlN Coatings Prepared by Arc Ion Plating Technique[J]. Surface and Coatings Technology,2002,161(2-3) :237-242.
  • 10Window B. Recent Advances in Sputter Deposition[J]. Surface and Coatings Technology, 1995, (71) : 93-97.

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