摘要
采用磁控溅射方法在K9光学玻璃基片上沉积一定厚度的铜薄膜,通过X射线衍射仪、紫外-可见分光光度计、光栅光谱仪等检测铜薄膜结构、光吸收性质。检测结果表明:所制备的Cu膜结晶度较好;Cu膜的吸收波段较宽,半峰全宽为201 nm,但光栅光谱仪所得的吸收谱与紫外可见光分度计所得吸收谱存在差异:对同一金属薄膜,由光栅光谱仪得到的吸收光谱比由紫外可见分光光度计得到的吸收光谱,峰位产生了"红移",且峰数不同,原因是光源的不同及实验仪器分辨率的不同。
Copper thin films are deposited on K9 optical glass substrate by magnetron sputtering method. By X-ray diffraction, the structure of copper film are detected. By Ultraviolet (UV)-visible spectrophotometer and grating spectrometer, the optical absorption properties of copper film are detected. The results show that: for the same Cu thin films, the peak-number and peak position obtained by two different instrument are different. The peak of absorption spectrum is two obtained by grating spectrometer and has a "red shift" to that obtained by UV-visible spectrophotometer, this due to the different instrument resolutions and different light sources.
出处
《激光与光电子学进展》
CSCD
北大核心
2015年第9期321-324,共4页
Laser & Optoelectronics Progress
基金
河南省基础与前沿项目(122300410129)
关键词
光谱学
吸收光谱
铜膜
磁控溅射
光栅光谱仪
紫外-可见光光度计
spectroscopy
absorption spectrometry
copper thin films
megnetron sputtering
grating spectrometer
ultraviolet-visible spectrophotometer