Ag掺杂Cu2O薄膜的制备及光催化性能研究

The Preparation and Photocatalytic Performance of Ag-Doped Cu_2O film

通过磁控溅射方法制备了Ag掺杂Cu2O纳米薄膜。用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、X射线光电能谱(XPS)和荧光光谱仪(FLO)对薄膜的晶体结构、表面形貌、表面性能和光催化性能进行了分析。研究表明,Ag的掺杂使得Cu2O薄膜表面粗糙度增加、光生电子和空穴的复合率降低,并且可见光催化活性明显提高;在光照120min后,降解率达到了50%以上;Ag掺杂也了改进了薄膜的稳定性和可重复性。

Ag‐doped Cu2 O thin films were prepared by magnetron sputtering method .X‐ray diffractometry （XRD） ,scanning electron microscopy （SEM ） ,X‐ray photoelectric spectroscopy （XPS） and fluorescence spectrometry （FLO） were used to charactevize the crystal structure ,sur‐face morphology and properties ,and catalytic performance of the films .Studies show that Ag‐doped Cu2O films had higher catalytic activity than pure Cu2O films ,which is attributed to the de‐crease of particle size ,the increase in surface roughness ,and the decreased recombination of light‐induced electrons and holes by Ag‐doping .