无电化学沉积法合成铜纳米线

Synthesis of Copper Nanowires by Electroless-Chemical Deposition

采用无电化学沉积法制备铜纳米线,与电化学沉积法不同,无电化学沉积法不需要在通孔模板的一面溅射一层导电金膜作为阴极,以及持续供给电力才能完成纳米线的合成.考察沉积时间、敏化液等因素对铜纳米线制备的影响.使用扫描电子显微镜(SEM),X射线衍射(XRD)对样品其进行检测,结果表明,无电化学沉积法首先形成纳米粒子,随着沉积时间的延长,纳米粒子逐渐融合形成纳米管、纳米线.制备的铜纳米线为多晶态结构.在没有模板限制的情况下,铜原子自催化生长形成类似于花瓣的结构.用95%乙醇代替水配制的敏化液性质较稳定,但是,与以水配制的敏化液相比,在大约相同的沉积时间条件下较不易形成纳米线.

Electroless chemical deposition instead of electrochemical deposition was adopted to prepare copper nanowires in that electroless chemical deposition neither has to sputter a layer of gold as cathode on one side of the through-hole template nor supplies power to complete the synthesis of nanowires.The effect of sensitizing solution and deposition time on the preparation of copper nanowires was discussed.Scanning electron microscopy （SEM）and X-ray diffraction （XRD ）were applied to observe the morphologies of the samples.The experimental results showed that nanoparticles were firstly formed in the process of deposition,and then they gradually merged to form nanotubes and nanowires with the increase of deposition time.The copper nanowires prepared by electroless chemical deposition were multi-crystal structures.In the templateless case,the copper atoms grew to form petal-like structures by autocatalysis.The sensitizing solution diluted with 95% ethanol was more stable than that with water,but it was less likely to form nanowires compared to the sensitizing solution with water in about the same deposition time.