摘要
采用脉冲激光沉积(PLD)法,在多孔支撑的NiO-YSZ阳极基底上制备YSZ电解质薄膜。利用XRD、SEM和射频阻抗/材料分析仪对多层膜的物相结构、表面形貌以及电学特性等进行表征。实验结果发现,YSZ电解质薄膜在300-500℃之间,其电导活化能最小值为0.86e V,电导率可达到7.96×10-5s/cm。
This study is focused on the yttria stabilized zirconia (YSZ)thin films onto porous supporting NiO-YSZ anode substrates using pulsed laser deposition (PLD). The phase, structure, surface morphology and electrical properties of oxygen ion conductor electrolyte of YSZ thin films were characterized by X-ray diffraction (XRD), scanning electron microscope (SEM)and electrochemical impedance spectroscopy, respectively. Minimum conductivity activation energy of YSZ thin films is 0.86eV at 300- 500%, and the conductivity can achieve 7.96×10^-5s/cm.
出处
《真空》
CAS
2015年第5期35-38,共4页
Vacuum
基金
国家自然科学基金项目(批准号:11264025)