环氧树脂类双偶氮苯聚合物BP-2A-35-CN表面起伏光栅刻写研究

Study of surface relief-gratings lithography of epoxy-based bisazobenzene polymer BP-2A-35-CN

合成了具有良好光致质量迁移效应和宽光谱响应范围的环氧树脂类双偶氮苯聚合物BP-2A-35-CN,测量了聚合物薄膜的紫外-可见吸收光谱。用532nm激光双光束干涉刻写了一维偶氮苯聚合物表面起伏光栅。提出了将样品旋转90°刻写二维偶氮苯聚合物表面起伏光栅的方法,并成功刻写了二维表面起伏光栅。用BP-2A-35-CN偶氮苯聚合薄膜做光刻介质,用双光束干涉结合样品旋转方法,可实现基于可见光波段的激光干涉刻写表面起伏光栅的工艺简单的低成本光刻技术。

Epoxy-based bisazobenzene polymer BP-2A-35-CN with favorable photoinduced mass transport phenomena and wide spectral response range was synthesized,and the UV-Vis absorption spectrum of the polymer film was measured.One-dimensional surface relief-gratings(SRGS)of azobenzene polymer was inscribed by two 532 nm laser beams interference.The lithography method of two-dimensional SRGS of azobenzene polymer was proposed by rotating the sample with 90°,and the two dimensional SRGS was successfully inscribed.The suggested lithography method could realize simple technics and low cost lithography technology by visible light waveband laser interference,which uses azobenzene polymer BP-2A-35-CN as the photolithography medium and bases on two laser beams interference combing sample rotation.