期刊文献+

Theoretical analysis of semi/non-polar In GaN/GaN light-emitting diodes grown on silicon substrates

Theoretical analysis of semi/non-polar In GaN/GaN light-emitting diodes grown on silicon substrates
下载PDF
导出
摘要 A theoretical study of polar and semi/non-polar InGaN/GaN light-emitting diodes(LEDs) with different internal surface polarization charges, which can be grown on Si substrates, is conducted by using APSYS software. In comparison with polar structure LEDs, the semi-polar structure exhibits a higher concentration of electrons and holes and radiative recombination rate, and its reduced built-in polarization field weakens the extent of band bending which causes the shift of peak emission wavelength. So the efficiency droop of semi-polar InGaN/GaN LEDs declines obviously and the optical power is significantly improved. In comparison with non-polar structure LEDs, although the concentration of holes and electrons as well as the radiative recombination rate of the semi-polar structure are better in the last two quantum wells(QWs) approaching the p-Ga N side, the uniformity of distribution of carriers and radiative recombination rate for the nonpolar structure is better. So the theoretical analysis indicates that the removal of the internal polarization field in the MQWs active regions for non-polar structure LEDs contributes to the uniform distribution of electrons and holes, and decreases the electron leakage. Thus it enhances the radiative recombination rate, and further improves the IQEs and optical powers, and shows the best photoelectric properties among these three structures. A theoretical study of polar and semi/non-polar InGaN/GaN light-emitting diodes(LEDs) with different internal surface polarization charges, which can be grown on Si substrates, is conducted by using APSYS software. In comparison with polar structure LEDs, the semi-polar structure exhibits a higher concentration of electrons and holes and radiative recombination rate, and its reduced built-in polarization field weakens the extent of band bending which causes the shift of peak emission wavelength. So the efficiency droop of semi-polar InGaN/GaN LEDs declines obviously and the optical power is significantly improved. In comparison with non-polar structure LEDs, although the concentration of holes and electrons as well as the radiative recombination rate of the semi-polar structure are better in the last two quantum wells(QWs) approaching the p-Ga N side, the uniformity of distribution of carriers and radiative recombination rate for the nonpolar structure is better. So the theoretical analysis indicates that the removal of the internal polarization field in the MQWs active regions for non-polar structure LEDs contributes to the uniform distribution of electrons and holes, and decreases the electron leakage. Thus it enhances the radiative recombination rate, and further improves the IQEs and optical powers, and shows the best photoelectric properties among these three structures.
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2015年第7期507-511,共5页 中国物理B(英文版)
基金 Project supported by the National Natural Science Foundation of China(Grant No.51172079) the Science and Technology Program of Guangdong Province,China(Grant Nos.2010B090400456 and 2010A081002002) the Science and Technology Program of Guangzhou,China(Grant No.2011J4300018) the Program for Changjiang Scholars and Innovative Research Team in Universities of China(Grant No.IRT13064)
关键词 semi/non-polar InGaN/GaN LEDs APSYS Si substrate semi/non-polar,InGaN/GaN LEDs,APSYS,Si substrate
  • 相关文献

参考文献27

  • 1Wang T, Bai J, Sakai S and Ho J K 2001 Appl. Phys. Lett. 78 2617.
  • 2Zhuo X J, Zhang J, Li D W, Yi H X, Ren Z W, Tong J H, Wang X F, Chen X, Zhao B J, Wang W L and Li S T 2014 Chin. Phys. B 23 068502.
  • 3Bernardini F, Fiorentini V and Vanderbilt D 1997 Phys. Rev. B 56 r10024.
  • 4Rau B, Waltereit P, Brandt O, Ramsteiner M, Ploog K H, Puls J and Henneberger F 2000 Appl. Phys. Lett. 77 3343.
  • 5Hisashi M, Mathew C S, Arpan C, Nakamura S and Steven P D 2006 Jpn. J. Appl. Phys. 45 7661.
  • 6Jung S, Jung S, Chang Y, Bang K H, Kim H G, Choi Y H, Hwang S M and Baik K H 2012 Semicond. Sci. Tech. 27 024017.
  • 7Zhou X W, Xu S R, Zhang J C, Dang J Y, Lv L, Hao Y and Guo L X 2012 Chin. Phys. B 21 67803.
  • 8Zhao L B, Yu T J, Wu J J, Yang Z J and Zhang G Y 2010 Chin. Phys. B 19 18101.
  • 9Ravash R, Ravash R, Dadgar A, Bertram F, Dempewolf A, Metzner S, Hempel T, Christen J and Krost A 2013 J. Cryst. Growth 370 288.
  • 10Reuters B, Strate J, Hahn H, Finken M, Wille A, Heuken M, Kalisch H and Vescan A 2014 J. Cryst. Growth 391 33.

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部