一种UV固化抗静电型硬化薄膜的制备

Preparation and properties of a UV curable antistatic hard coating film

以六官能度聚氨酯丙烯酸酯预聚物和乙氧基化三羟甲基丙烷三丙烯酸酯单体为主体,甲基异丁基酮、丁酮和丙二醇甲醚为混合溶剂,1-羟基环己基苯基甲酮为光引发剂,纳米SiO_2分散液和导电高分子分散液CIL313为添加剂,有机硅聚醚为流平剂,制备了高硬度、耐摩擦抗静电型硬化薄膜,讨论了光引发剂用量、UV固化条件、纳米SiO_2分散液用量、流平剂、抗静电剂用量等对硬化薄膜外观与性能的影响。结果表明,当光引发剂用量8质量份,固化条件:200 mW/cm^2、300 mJ/cm^2,纳米SiO_2分散液用量30质量份,流平剂用量0.4质量份,抗静电剂用量10质量份时制备的硬化薄膜综合性能优异,其铅笔硬度3H5/5,耐摩擦性116次/200 g,表面电阻10^(10)Ω,全光透过率90.4%,雾度0.9%。

With the hexa-functional polyurethane acrylate prepolymer and ethoxylated trimethylolpropane triacrylate as the main materials, isobutyl methyl ketone, 2-butanone and proprylene glycol monomethyl ether as the mixed solvent, 1-hydroxycyclohexyl pheuyl ketone as the photoinitiator, the nano-SiO2 and conductive polymer as the additives, silicone polyether as the flatting agent, anti-static HC film with high hardnessand scratch resistance was prepared. And the influences of photoinitiator, UV curing conditions, nano-SiO2 dispersion, flatting agent and conductive polymer were investigated on the appearance and performance of the HC film. The results showed that the HC film had good combined performance with pencil hardness of 3H5/5, scratch resistance of 116 times 200 g, sheet resistance is 10^10 Ω, total transmittance of 90.4% and haze of 0.9% when the photoinitiator, nano-SiO2 dispersion, flatting agent, conductive polymer and the UV curing conditions were 8 parts, 30 parts, 0.4 parts, 10 parts and 200 mW/cm^2, 300 mJ/cm^2, respectively.