沉积气压对杂化离子镀TiCN薄膜结构和性能的影响

Effects of Deposition Pressure on Structure and Properties of TiCN Films by Hybrid Ion Plating

TiCN薄膜在刀模具领域有着广泛的应用前景,但它的结构和性能往往随制备工艺参数的不同而有较大差异。为了研究沉积气压对杂化离子镀TiCN薄膜结构和性能的影响,找到合适的Ar和N2分压比以优化工艺参数,采用杂化离子镀技术在高速钢、硅片以及不锈钢片表面制备TiCN薄膜,通过改变沉积过程中Ar和N2的分压获得不同的薄膜。用X射线衍射仪、扫描电子显微镜、维氏硬度计、摩擦磨损仪、XP-2台阶仪对薄膜的物相结构、表面形貌、显微硬度、摩擦因数和沉积速率进行表征。结果表明:TiCN膜层择优生长方向主要表现为TiCN相的(111)晶面;试验中保持Ar分压为0.1Pa不变,增加N2分压,即沉积气压增大,薄膜的显微硬度先升高再降低,对应摩擦因数先降低再升高,沉积速率不断减小最终趋于平缓,而表面形貌受沉积气压变化的影响很小。

TiCN thin films have great potential applications in cutting tools and moulds. However, their structure and properties are often influenced by the fabrication methods. In order to investigate the effects of deposition pressure on the structure and properties of the TiCN films, and to optimize the partial ratio of Ar and N2, several film samples were fab ricated by hybrid ion plating on high-speed steel, silicon slice and stainless steel under different deposition pressures through varying Ar and N2 ratio. Phase structure, surface morphology, hardness, friction coefficient and thickness of the samples were investigated by XRD, SEM, Vicker＇s tester, friction and wear tester, and XP-2 profiler, respectively. Based on the experimental results, the influence of deposition pressure on the structure and mechanical properties of the films were analyzed and discussed. The results show that the TiCN films have （111） preferential growth direction. The surface quality of the films is improved by elevated deposition pressure, which is realized by increasing N2 partial pressure and keeping the Ar partial pressure. Micro-hardness of the films firstly increases and then decreases with increasing dep- osition pressure. The changes of the friction coefficient opposite to the micro-hardness. Deposition rate decreases with increasing deposition pressure. It is indicated that the deposition pressure has little effects on the surface morphology of the films.