电沉积法制备纳米铜粉的研究

STUDY ON ELECTRODEPOSITION PREPARATION OF COPPER NANOPARTICLES

研究了在摩尔比为2∶1的尿素-氯化胆碱（Urea-ChCl）低共融溶剂（DES）中,将氧化亚铜溶解在该体系中,采用恒电位电沉积法,制备出了颗粒尺寸在40 nm左右的纳米铜粉.通过单因素条件试验,结合扫描电镜（SEM）分析及电流效率分析,确定电沉积制备纳米铜粉的最佳试验条件为：阴极材料为镍片,电解液温度为313～323 K,槽电压为2.5V,电沉积时间为2h.

Copper nanoparticles （40 nm in diameter） were prepared by constant voltage electrolysis in the mo- lar ratio of 2： l urea-choline chloride （ChCl） based deep eutectie solvent with Cu（ I ） oxide （Cu20） as precursor. The optimal experimental condition of preparing copper nanoparticles by eleetrodeposition, which was determined by single factor experiment and combined with scanning electron microscopy （SEM） analysis and current ef- ficiency analysis, is using nickel plate as the cathode material, the electrolyte temperature being 313 -323 K, the cell voltage 2.5V and the electrodeposition time 2 h.