基底的结构形态与磁控溅射织物导电性能的关系

Relationship between the structure of fabric and magnetron sputtering conductive property

通过磁控溅射方法使得金属粒子与织物结合在一起,制备导电织物。并对不同基材磁控溅射织物的导电性能测试,分析比较了涤纶针织布、涤纶机织物、纯棉机织物和纸板上溅射铜膜的导电性能。采用扫描电子显微镜(SEM)对织物进行表征,观察基底的表面形貌。研究了基布的连续性和致密性对导电性能和电磁屏蔽性能的影响。结果表明:不同的基底材料对磁控溅射镀膜织物的导电性能影响有一定的差异,基底材料结构越致密、表面越连续,其导电性能越好。

By the magnetron sputtering method,preparing a conductive fabric so that the metal particles together with the fabric.Testing the conductivity of different fabric substrates by magnetron sputtering.Analysis and comparison of the electrical properties of polyester knitted fabrics,polyester woven fabrics,cotton woven fabric and cardboard sputtered copper film,respectively.Surface morphology of the fabric characterized by scanning electron microscopy（SEM）.The affect of the continuity and compactness of fabric on conductivity and electromagnetic shielding performance were studied.The results showed that different substrate materials had certain differences affect for the conductivity of the fabric of magnetron sputtering.The more compact the base material structure,the more continuous surface and better conductivity performance.