摘要
瓷砖的抛磨影响因素众多,实际磨削加工时容易出现漏抛、返抛现象。对陶瓷抛光机磨头进行运动学分析,并基于不同粒度号的磨粒在一定压力下的加工深度模型,探讨抛光机磨头转速、横梁摆动频率、传送速度对瓷砖抛光加工表面均匀性的影响,然后结合磨削机理使用MATLAB软件对陶瓷抛光过程进行仿真。最后使用多组不同的运动参数进行模拟试验,分析不同条件下抛光的均匀性影响。
Many factors affect the polishing of ceramic tile. In the actual grinding process, it is easy to occur the phenomenon of without polishing in certain areas or polishing again. This paper mainly analyzes kinematics of polishing head in polisher and based on the model of grinding depth under certain pressure with different grain size, studies the influence of rotational speed of the abrasive disk, frequency of the lateral oscillation forward and speed of the polishing line on homogeneity of polishing surface, then combined with the grinding mechanism, using MATLAB software to simulate the polished ceramic process modeling. Finally, using multiple groups of different parameters to simulate, analyzed the effects of the uniformity in different conditions of polishing.
出处
《机电工程技术》
2015年第10期61-65,共5页
Mechanical & Electrical Engineering Technology
基金
广东省自然科学基金(编号:501130093)
关键词
陶瓷抛光机
均匀性
运动参数
仿真
polisher
uniformity
movement parameter
simulation
