轴对称磁场对电弧离子镀TiN-Cu纳米复合膜性能的影响

Influence of Axisymmetric Magnetic Field on Properties of TiN-Cu Nanocomposite Films Prepared by Arc Ion Plating

在电弧离子镀靶后端加入轴对称线圈磁场,制备了TiN-Cu纳米复合膜。观察线圈磁场强度对靶表面电弧斑点游动速率和弧柱形状的影响,及其对沉积薄膜的表面形貌、沉积速率、纳米压痕硬度和弹性模量的影响。结果表明,提高线圈磁场强度可提高电弧斑点的游动速率,进而降低靶表面金属液滴喷射几率,减小沉积薄膜中大颗粒的尺寸和数量。X射线衍射(XRD)谱显示,沉积薄膜只含有TiN相,未出现金属Cu或其化合物的衍射峰;薄膜呈现明显的(111)晶面择优取向。随着线圈磁场强度的提高薄膜沉积速率、压痕硬度和弹性模量先增加,达到最大值后又略有减少,其最大硬度和弹性模量分别达到35.46GPa和487.61GPa。

TiN-Cu nanocomposite films were deposited on high speed steel by arc ion plating with an axisymmetric coil magnetic field at the back of the target. The influence of the coil magnetic field intensity on the moving rate of cathode spot and arc column shape on the target surface, as well as on the surface morphology, deposition rate, nanoindentation hardness and elastic modulus of the deposits was investi- gated. It is shown that the emitting probability of the melt metal drops on the target decreases, and the size and quantity of the macroparticles in the deposited films reduces with the increasing coil magnetic field intensity. The deposited films consists merely of TiN phase without metal Cu phase or Cu compound and possess an obvious preferred orientation along （111） plane. The deposition rate, indentation hard- ness and elastic modulus of the films increase rapidly to a maximum value and then decrease slightly with the increasing coil magnetic field intensity. The maximum values of hardness and elastic modulus are 35.46 GPa and 487.61 GPa, respectively.