摘要
采用多弧离子镀技术,以N2为氮源,C2H2为碳源,Ti为靶源,在单晶硅和硬质合金衬底上沉积Ti CN硬质涂层,系统地研究制备工艺对Ti CN涂层的结构、形貌、硬度及摩擦学性能的影响.用X射线衍射、原子力显微镜和扫描电子显微镜测量了涂层的形貌和晶体结构;用HX-1000显微硬度计和HH-3000划痕仪测量了涂层的硬度和结合强度.研究结果表明:Ti CN和Ti N涂层同为单相的Na Cl型面心立方结构;在优化条件下制备的Ti CN涂层的最高硬度为38.5 GPa,远高于Ti N涂层的27.9 GPa硬度;Ti CN涂层与硬质合金的膜基结合力超过70 N.
Ti CN hard coatings have been deposited on single crystal silicon and cemented carbide substrates by multi-arc deposition plating techniques using N2 and C2H2as N and C source,respectively,with Ti Target. Coatings morphology,crystal structure,mechanical and tribological properties of Ti CN coatings were studied by X-ray diffraction,atomic force microscopy,scanning electron microscopy,microindentation,and scarification testing. The results showed that both Ti CN and Ti N coatings had Na Cl-type fcc structure. The maximum hardness of the Ti CN coating is 38. 5 GPa,which is much higher than that of Ti N coating( 24. 9 GPa). The adhesion force of the Ti CN coating prepared under optimal condition exceeds 70 N.
出处
《武汉大学学报(理学版)》
CAS
CSCD
北大核心
2015年第5期445-448,共4页
Journal of Wuhan University:Natural Science Edition
基金
国家科技部国际合作项目(2015DFR00720)
中央高校基本科研业务费专项资金资助(2012202020217)