Tetraalkylammonium Fluorosilicates as Precursors for Electrochemical Deposition of Silicon Coatings. Synthesis and Thermal Stability
Tetraalkylammonium Fluorosilicates as Precursors for Electrochemical Deposition of Silicon Coatings. Synthesis and Thermal Stability
摘要
Several TAAFS （tetraalkylammonium hexafluorosilicates） with different cations were synthesized. Their thermal properties were studied showing that obtained complexes are stable enough to be suitable for electrochemical deposition of silicon coatings under temperatures at least up to 200 ℃.
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