酸性蚀刻中图形补偿的研究

Study on graphics compensation in acid etching

文章通过对不同设计方式的线路侧蚀进行测试，根据测试结果对不同设计方式的线路使用不同的底片补偿，达到酸蚀后线宽一致的目的，同时还需要考虑工艺制程中对蚀刻因子的影响，如：曝光、显影和蚀刻。

The line side erosion of the different design methods were tested, according to test results of different design methods of line using different film compensation, has reached the etching linewidth consistent, also need to consider the process of etching factor influence, such as： exposure, development and etching.