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一种局部厚铜HDI工艺产品开发

Research on the partial-thick Cu HDI technology
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摘要 文章通过对一种局部厚铜+HDI工艺产品进行制作研究,通过分析设计与工艺制作难点,重点对叠层结构设计、内外层图形、内层铜厚、盲孔工艺、电镀填平、局部镀厚铜工艺方法、多次电镀设计、POFV等工艺制作难点进行研究,找出了工艺难点的有效设计与解决方法;经对局部厚铜HDI板进行产品制作,成品耐热测试满足要求;验证了局部厚铜HDI工艺技术可行性;通过此项目研究,成功开发了局部厚铜HDI制作工艺技术。 In this paper, We study the manufacturing technology about the partial-thick cu HDI, At first, we analyze the technical difficult issues about partial-thick cu HDI,for example the board structure design, and analyzing the figure of inner ,and the inner cu thick requirement, and etc. We do some research and evaluating about partial-thick-cu and HDI process technology, for example, designing the via hole manufacturing process technology and the partial-thick copper technology process, researching the way about plating thick-cu, and the way about through holes POFV, and the via plating flatten, etc. We test the suitable ways to solve the process difficult issues; Through producing the board of partial-thick cu HDI, we evaluate the manufacturing technology; Finally, we test the products quality. All the results meet the standard requirements; In this study, we research & develop successfully the manufacturing technologies about the partial-thick cu HDI products.
出处 《印制电路信息》 2015年第A01期360-371,共12页 Printed Circuit Information
关键词 局部厚铜高密度互连 盲孔 电镀填平 树脂塞孔后再镀覆铜 Partial-Thick Cu HDI Via Hole Plating-Flatten POFU(Plating Over Filling Via)
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