不同抛光方法对钴铬钼合金表面粗糙度的影响

The study on surface roughness of Co-Cr-Mo alloy trealed with differents polishing methods

目的:比较机械抛光、化学抛光和电解抛光对钴铬钼合金试件表面粗糙度的影响。方法:制作钴铬钼合金试件60个,随机分为机械抛光组、化学抛光组和电解抛光组,对其表面进行抛光处理后,在不同氟浓度溶液里浸泡24h,记录试件抛光后的减重率(wt﹪),测量表面粗糙度Ra值,并用扫描电镜(SEM)观察试件表面形态变化。结果:相同氟浓度下,试件经过不同抛光处理后,减重率和表面粗糙度Ra值都有显著差异(P<0.05),不同氟浓度下,相同的抛光方法后,试件表面粗糙度有显著性差异(P<0.05)。扫描电镜观察,电解抛光后钴铬钼合金表面更加光滑,均匀一致。结论:应用电解抛光法处理钴铬钼合金试件其表面形貌更好。

Objective： To investigate the influence of mechanic polishing, chemical polishing and electrolytic polishing on Surface Roughness of Co-Cr-Mo alloy. Method： 60 Co-Cr-Mo alloy specimen were prepared and randomly divided into three groups, then differents surface polishing was made to each group separately. Then The weight loss ratio （wt % ） arid Ra value were measured. Scanning electron microscope （SEM） was used to confirm the surface change of test samples. Result： The results showed that in the same F-solutlon, the weight-relief and surface roughness Ra value had significant difference （P 〈0.05） with differents polishing methods, but, with the same polishing method, the weight-relief and surface roughness Ra value had also significant difference （P 〈0.05） in different F-solution. SEM results showed that the surface of mechanic pol- ishing group were evident and that of chemical polishing group were not very evident. There were not marks on the surface of electrolytic polishing group. Conclusion： The surface roughness of Co-Cr-Mo alloy was inferior to that of electrolytic pol-ishing group.