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电感耦合等离子体原子发射光谱法测定Cu-Ni-Mn钎料中铝、钽元素含量 被引量:1

Determination of Aluminium and Tantalum in Cu-Ni-Mn Brazing Filler Metals with Inductively Coupled Plasma Atomic Emission Spectrometry
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摘要 采用电感耦合等离子体原子发射光谱法测定Cu-Ni-Mn钎料中的铝和钽元素含量。实验探讨了Cu-Ni-Mn钎料中基体元素及共存元素对铝、钽元素分析谱线的光谱干扰情况,确定了合适的分析谱线和背景校正方法。铝、钽元素的分析谱线分别为396.152nm和240.063nm。根据Cu-Ni-Mn钎料中铝、钽元素含量范围,合成系列标准溶液,建立标准工作曲线,工作曲线的线性范围为0.05%-0.20%,线性相关系数分别为0.9996和0.9988,此方法用于测定铝、钽元素的检出限分别为0.0012%和0.0084%,相对标准偏差为2.43%-4.55%(n=8o标准加入回收率为100%-119%。该法可用于测定Cu-Ni-Mn合金中的铝和钽含量。 The content of aluminium and tantalum in Cu-Ni-Mn brazing filler metals was determined by inductively coupled plasma atomic emission spectrometry. The interferences from matrix elements and coexist elements were studied. The analysis spectral lines and the method for background correction were determined, the analytical wavelengths were 396.152 nm and 240,063 nm respectively. The linear range was 0.05%-0.20% for aluminium and tantalum with regression coefficients of 0.999 6 for aluminium and 0.998 8 for tantalum. The detection limits were 0.0012% for aluminium and 0.0084% for tantalum, the relative standard deviations of dectection results were 2.43%-4.55%(n=8). The recovery ranged from 100% to 119%, The method can be used to determine aluminium and tantalum in Cu-Ni-Mn alloy.
出处 《化学分析计量》 CAS 2015年第6期48-51,55,共5页 Chemical Analysis And Meterage
关键词 电感耦合等离子体原子发射光谱法 Cu—Ni.Mn钎料 inductively coupled plasma atomic emission spectrometry Cu-Ni-Mn brazing filler metals aluminium tantalum
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